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Reactive high power impulse magnetron sputtering of CF_x thin films in mixed Ar/CF₄ and Ar/C₄F₈ dischargesSCHMIDT, S; GOYENOLA, C; GUEORGUIEV, G. K et al.Thin solid films. 2013, Vol 542, pp 21-30, issn 0040-6090, 10 p.Article

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LOADING EFFECT AND TEMPERATURE DEPENDENCE OF ETCH RATE OF SILICON MATERIALS IN CF₄ PLASMAENOMOTO T.1980; SOLID STATE TECHNOL.; USA; DA. 1980; VOL. 23; NO 4; PP. 117-121; BIBL. 8 REF.Article

EXPERIMENTAL EVALUATION OF CRYOGENIC HEAT PIPES WITH VARIOUS HEAT CARRIERS AND CAPILLARY STRUCTURESKREEB H; MOLT W.1978; INTERNATIONAL HEAT PIPE CONFERENCE. 3/1978/PALO ALTO CA; USA; DA. 1978; PP. 203-210; BIBL. 7 REF.Conference Paper

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CF₄ LASER OSCILLATOR-AMPLIFIER MEASUREMENTS: SMALL SIGNAL GAIN AND SELF-ABSORPTIONECKHARDT RC; HINSLEY R; PILCH M et al.1979; OPT. LETTERS; USA; DA. 1979; VOL. 4; NO 4; PP. 112-114; BIBL. 5 REF.Article

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EFFET D'UN PLASMA BASSE TEMPERATURE, UTILISE EN TECHNOLOGIE DE MICROELECTRONIQUE, SUR LES COUCHES D'ENDUITS PHOTORESISTANTSLUBY SH; GULDAN A; CHERVENAK YA et al.1979; POLUPROVODN. MIKROELEKTRON.; UKR; DA. 1979; NO 30; PP. 55-64; BIBL. 12 REF.Article

DIFFUSION OF GASEOUS FLUOROMETHANES IN AIR.RAW CJG; RAW TT.1976; CHEM. PHYS. LETTERS; NETHERL.; DA. 1976; VOL. 44; NO 2; PP. 255-256; BIBL. 6 REF.Article

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COLLISION INDUCED MICROWAVE ABSORPTION IN N₂, CH₄ AND CF₄ IN THE GASEOUS AND LIQUID PHASES.URBANIAK JL; DAGG IR; REESOR GE et al.1977; CANAD. J. PHYS.; CANADA; DA. 1977; VOL. 55; NO 6; PP. 496-505; ABS. FR.; BIBL. 19 REF.Article

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